LIGHT SOURCES
  • ArF Excimer Laser; Lambda Physik 220i; (250 mJ @ 193 nm, max 200 Hz)
  • ArF Excimer Laser; Lambda Physik Compex 205; (300 mJ @ 193 nm, max 10 Hz)
  • Nd: YAG laser; Spectra Physics Quanta-Ray INDI-HG; (50mJ @ 266nm, 150mJ @ 355nm, 200mJ @ 532nm, 450mJ @ 1064nm, Q-switch: 5 -8 ns, 10Hz)
  • Xe2 Excimer Lamp; ABB-UVigo;   (172 nm)
  • Xe2 Excimer Lamp; Heraeus Noblelight;  (172 nm)
  • He-Ne laser and several diode lasers for alignment
  • Femtosecond laser system from Spectra Physics (shared with the   “Optical Metrology Group”)
    • Oscillator; MillenniaPro-Tsunami; (5 nJ @ 790 nm, 35 fs)
    • Regenerative amplifier; Empower-Spitfire;  (0.7 mJ @ 790 nm, 37 fs)
    • Optical parametric amplifier; OPA800CF-HGII (0.07 mJ @ <<1000 – 3000 nm, 0.001 – 0.025 mJ @ 300 – 1200 nm, 40 fs)
OPTOMECHANICS
  • Optical benches with conventional and precision mounts for optical components
  • Manual and motorized high precision xyz tables in inert atmosphere (Newport)
  • Mask projection system for 193 nm (reduction x5, 0-1.5 J / cm2)
  • 2 Laser beam homogenizers for 193 nm radiation
    • Microlas (Spot size 4×4 mm2 – 6×6 mm2
    • Exitech EX-HS-700D (10 different spot sizes 0.4 x 0.8 mm2 – 5.2 x 10.5 mm2; 0-3mJ / cm2 in air or inert gas, 0-1J/cm2 in vacuum)
OVENS, EQUIPMENT FOR BIOLOGICAL AND CHEMICAL TESTING
  • Si Oxidation Oven
  • Pyrolysis oven
  • Oven for infiltration of Si
  • Induction heater with pyrometer; Ambrell EasyHeat & Micro epsilon
  • Stove for biomimetic experiments
  • Cabin to operate with toxic compounds
  • Drying stove; Selecta Incudigit 80C (max.80ºC)
  • Autoclave for steam sterilization; Selecta Presoclave II 75  (75 l, max 150ºC, max 2.5 bar)
  • Ultra low temperature freezer; Sanyo VIP + MDF-C8V1  (min.-80ºC)
  • Vertical laminar flow hood; Telstar V100 with HEPA filters and UV sterilizer (in Biolab)
  • Vertical laminar flow hood; Telstar AV30 / 70 with HEPA filters and output filters (in Laserlab)
  • CO2 Incubator MCO19AI
  • Vacuum cleaner with water filter (HEPA); Kärcher D5600
SYSTEMS TO CONTROL GASES, HIGH VACUUM AND FILM GROWTH
  • Processing gas control system (SiH4, Si2 H6, GeH4, B2H6, C2H4, NH3, N2 O, F 2, H2, H2 O, He, Ar, Ne)
  • High vacuum system (Base pressure 10-6 mbar ) for processing biomaterials using PLD (Pulsed Laser Deposition)
  • High vacuum system (Base pressure 10-6 mbar ) to modify surfaces by laser radiation
  • High vacuum system (Base pressure 10-12 mbar ) to measure gas effusion
  • Thermal Evaporator (Base Pressure 10-7 mbar )
  • Spin coater Laurell WZ-650- 23 NPP
  • Leak detector Balzers HLT150
  • Air filtration units (HEPA), Telstar AVF-60, AVF-120, Cleanstar
  • Bionair Air Purifiers (HEPA)
  • High vacuum systems (Base pressure 10-10 mbar ) for semiconductor and dielectric processing
    • PLD (Pulsed Laser Deposition)
    • LCVD (Laser induced Chemical Vapor Deposition)
    • ELC (Excimer Laser assisted Crystallization) and
    • PLIE (Pulsed Laser Induced Epitaxy)
DETECTORS, POWER METERS AND POWER SOURCES
  • Various detectors; Ophir PE50-DIF, L150A, Thorlabs PM100D with S130C (400-1100 nm) , Scientec AC50HD, etc.
  • Digital Delay-Pulse generator Model 9600Plus
  • RF generator; ENI-HPG-2
  • Electric field generator
CHARACTERIZATION SYSTEMS
  • Gas effusion measurement system; Pfeiffer Vacuum Prism Plus (Mass 1-100)
  • Micro-Raman; Bruker Ramanscope RFS100 (2W @ 1064nm with lenses x5, x10, x50 and polarizers)
  • Portable Raman; B&W TEK i-Raman-785S Raman, BAC 100 Probe (785 nm, 175-3200 cm-1) and camcorder (x20)
  • Mechanical profilometer; Dektak 3ST
  • Portable contact angle meter; FIBRO System, Pocketgoniometer
  • CV/IV measurement system; Keithley 4140B pA, 4275A, 16055A (2-point test, Kelvin and van der Pauw method for 0-100ºC and vacuum, 4-point test)
  • Equipment for TRR (Time Resolved Reflectivity) measurements
  • Digital optical microscope; Optika DM (x10, x 40, x100)
  • Microplate reader; Biorad iMARK (415, 450, 490, 595, 655 and 750 nm)
  • Microbalance; COBOS  (max 320 g, +/- 1 mg)
  • Inverted microscope; Nikon Eclipse TS 100  (x10, x20, x40)
  • IR Thermometer, Sam Outillage
  • Thermal Imager; testo 881 (Obj .: 7, 5 mm, 25 mm; Sens.  & lt; 50mK; -20 – 550ºC)

Characterization equipment located in C.A.C.T.I.