University of Vigo > Department of Applied Physics > Laser Group > New Materials Group >


Castellano

FA3 - New Materials Group

 

Facilities and equipment

 

 

Facilities

  • Laboratory for processing materials with Excimer lasers and lamps (Laserlab)
  • Laboratory for biomorphic materials
  • Laboratory for cell culture (Biolab)
  • Laboratory for material characterization and femtosecond pulses
  • Ancillary mechanical and electronic workshops
    (shared with the groups "Optical Metrology" and "Industrial Applications of Lasers")
 

Equipment

  • Light Sources
    • ArF-Excimer Laser; Lamda Physik 220i; (250 mJ @ 193 nm, max. 200 Hz)
    • ArF-Excimer Laser; Lamda Physik Compex 205; (300 mJ @ 193 nm, max. 10 Hz)
    • Nd:YAG Laser; Spectra Physics Quanta-Ray INDI-HG;
      (50mJ@266nm, 150mJ@355nm, 200mJ@532nm, 450mJ@1064nm, Q-switch: 5 -8 ns, 10Hz)
    • Xe2-Excimer Lamp; ABB-UVigo; (172nm)
    • Xe2-Excimer Lamp; Heraeus Noblelight; (172 nm)
    • He-Ne Laser and various diode lasers for alignment
    • Femtosecond laser system; Spectra Physics; (shared with the group "Optical Metrology")
      • Oscillator; MillenniaPro-Tsunami; (5 nJ @ 790 nm, 35 fs)
      • Regenerative amplifier; Empower-Spitfire; (0,7 mJ @790 nm, 37 fs)
      • Optical parametric amplifier; OPA800CF -HGII
        (0,07 mJ @ < 1000 - 3000 nm, 0,001 - 0,025 mJ @ 300 - 1200 nm, 40 fs)
      • Optical autocorrelator; Pulse Scout
      • Optical components (mirrors, windows) for the full range of wavelength (250 - 3000 nm)
 
  • Gas Handling, High Vacuum, and Deposition Systems
    • Gas Handling system (SiH4, Si2H6, GeH4, B2H6, C2H4, NH3, N2O, F2, H2, H20, He, Ar, Ne)
    • High Vacuum System (Base pressure 10E-10 mbar) for processing semiconductors and dielectrics through
      • LCVD (Laser induced Chemical Vapour Deposition),
      • ELC (Excimer Laser assisted Crystallisation) and
      • PLIE (Pulsed Laser Induced Epitaxy)
    • 2 High Vacuum System (Base pressure 10E-6 mbar) for processing biomaterials through
      • PLD (Pulsed Laser Deposition)
    • High Vacuum System (Base pressure 10E-6 mbar) for modifying surfaces through laser radiation
    • High Vacuum System (Base pressure 10E-12 mbar) for Gas Effusion measurements
    • Thermal evaporation unit (Base pressure 10E-8 mbar)
    • Spin coater; Laurell WZ-650- 23NPP
    • Leakage Detector; Balzers HLT150
    • Air filtration units (HEPA), Telstar AVF-60, AVF-120, Cleanstar
    • Air purifiers (HEPA) Bionair
 
  • Opto-mechanical Hardware
    • Precision mounts and optical benches for conventional and high precision optical components
    • Manual and motorized high precision XYZ stages in inert gas aptmosphere (Newport)
    • 2 Beam homogenizers for 193 nm radiation
      • Microlas (Spot size 4x4 mm2 - 6x6 mm2)
      • Exitech EX-HS-700D (10 different spot sizes 0.4 x 0.8 mm2 - 5.2 x 10.5 mm2)
        (0-3mJ/cm2 in air or inert gas, 0-1J/cm2 in vacuum)
    • Mask projection unit (x5 reduction) for 193 nm (reduction x5, 0-1,5 J/cm2)
    • Windows, lenses, mirrors, phase masks and other components for manipulating visible and 193 nm laser radiation
 
  • Detectors, Measurement Equipments and other Sources
    • Several optical detectors; Ophir PE50-DIF, L150A, Thorlabs PM100D with S130C (400-1100 nm), Scientec AC50HD, Spiricon LBA300PC-Pulnix TM765E, Digital Videocamera Sony DCR-PC-109E, etc.
    • RF generator; ENI-HPG-2
    • Electric field generator; UVigo
 
  • Ovens, Equipments for Biological and Chemical experiments, and other equipments
    • Oven for Si oxidation
    • Oven for pyrolisis
    • Oven for Si infiltration
    • Induction heater with pyrometer; Ambrell EasyHeat & Micro epsilon CTL
    • Heater for biomimetic experiments; Selecta Incudigit
    • Fume hood for working with toxic components
    • Equipment for chemical experiments
    • Water Distiller; Pobel 702
    • Drying oven; Selecta Incudigit 80C (max.80ºC)
    • Water bath with digital regulation and reader, Selecta Precisdigit 6001197 (Max 100ºC)
    • Ultrasonic bath with temperatiure regulation, Bandelin Sonorex digitec (max.80ºC)
    • Autoclave for steam sterilization; Selecta Presoclave II 75 (75 l, max. 150ºC, max. 2.5 bar)
    • Ultra Low Temperature Freezer; Sanyo VIP+ MDF-C8V1 (min.-80ºC)
    • Vertical laminar flow Bench; Telstar V100 with HEPA filter and UV sterilizer (in Biolab)
    • Vertical laminar flow Bench; Telstar AV30/70 with HEPA filter and exhaust filters (in Laserlab)
    • CO2 Incubator; MCO19AIC (5% CO2, 37ºC)
    • Laboratory Centrifuge; Sigma 2-6 (480 ml, 4000 rpm)
    • Orbital platform shaker; Heidoph Rotamax 120
    • Vacuum tweezer; Pelco 520
    • Heater;
    • Water filter Vacuum cleaner (HEPA); Kärcher D5600
 
  • Equipment for Material Characterization
    • Equipment for measuring gas effusion;Pfeiffer Vacuum Prisma Plus (Mass 1-100)
    • Micro-Raman; Bruker Ramanscope RFS100; (2W @ 1064nm with objectives x5, x10, x50 and polarizers)
    • Portable Raman; B&W TEK i-Raman-785S Raman, BAC 100 Probe (785 nm, 175-3200 cm-1) & videocam. (x20)
    • Ellipsometer; Rudolph Research AutoEl; (3 wavelength)
    • Mechanical Profiler; Dektak 3ST
    • Portable equipments for contact angle measurements; FIBRO System, Pocketgoniometer
    • CV/IV measuring units; Keithley 4140B pA,4275A,16055A (2 point probe, Kelvin contacts, and van der Pauw for
      0-100ºC and in vacuum, 4 point probe)
    • TRR (Time Resolved Reflectivity) measurement equipment
    • Digital optical microscope; Optika DM (x10, x 40, x100)
    • Microplate reader; Biorad iMARK (415, 450, 490, 595, 655 y 750 nm)
    • Microbalance; COBOS (max. 320 g , +/- 1 mg)
    • Inverted microscope; Nikon Eclipse TS 100 (x10, x20, x40)
    • Ph meter Crison Basic 20
    • Conductivity Meter CRISON CM35+  with cell 50 60 (10 nS/cm - 500 mS/cm)
    • IR Thermometer, Sam Outillage
    • Thermographic camera; testo 881 (Obj.: 7, 5 mm, 25 mm; Sens. <50mK; -20 - 550 ºC)


Direct access to the following characterization equipment of the C.A.C.T.I.:

    • Micro-FTIR (transmision, reflection, ATR); Nicolet 6700 con Nicolet Continuum
    • Micro-HR-Raman with confocal microscope ( < 50 mW @ 488, 532, 633, and 785 nm )
      Horiba Jobin Yvon LAbRam-HR800
    • Spectroscopic Ellipsometer ( 190-2100 nm ); Horiba UVISEL
    • UV-VIS; HP845A Diode array
    • 2 XRD; Siemens D5000, XPert-Pro
    • SEM y TEM sample preparation equipments (cutting, polishing, PIPS691,...)
    • FIB; FEI Helios NanoLab with Omniprobe and EBSD (Electron backscattered diffraction)
    • 2 SEM; Philips XL30 (with EDS and WDS), JEOL JSM-6700F (Field emission, with EDS)
    • 2 TEM; Philips CM20, JEOL JEM-2010 (Field emission, with EDS, STEM and EELS)
    • SPM (Scanning Probe Microscope) AFM: Veeco Nanoscope V, Topometrix Explorer and Discoverer
    • 2 XPS/Auger; VG Thermo ESCALAB 250 iXL, K-Alpha
    • TOF-SIMS; ION-TOF TOF-SIMS IV (Bi Cluster Ion Source for Analyzing)
    • Nanoindenter; MTF Nanoindenter XL
    • Interferometric profiler; Wyko NT-1100
 
  • Computing
 
    • Several PC's for experimentation with acquisition and data processing board
Back to the New Materials home page
last updated: 07-04-2013 (newmaterials@uvigo.es)